Start / end date: June 10-14, 2013
This five days training course tries to give a condensed, but extensive overview of many aspects that are involved when entering the nanotechnology discipline. Starting with some description of technology and processing techniques, the course adresses the full chain from fabrication to characterisation of nanodevices (transistors, nanowires). After and introductory tour into cleanroom environnement and fabrication techniques, the first part of this training course will focus on practical works on fabrication, electrical and microwave characterisation of radiofrequency field effect transistor. The second part will focus on nano-fabrication and nano-characterisation using near field microscopes tools like atomic force microscope (AFM) and scanning tunnelling microscope (STM).
The aim of this training is to offer a structured view of the principles involved in the fabrication and characterisation of nano-components, oriented to radio-frequency applications. The program we propose during five days is planned to explore nanofabrication and techniques of nano-measurements, nano-characterisation and the physical principles behind them, as well as other experimental methods and instrumental skills necessary for research in this field.
The course is primarily aimed at postgraduate, PhD students and researchers from European universities and research institutes, as well as project or marketing managers with background in differents fields who want to learn more about fabrication, microwave and nano-characterisation and all the aspects that are involved when starting micro and nanotechnology. Researchers from industry and other organizations can also attend.
Day 1: (Henri HAPPY - Virginie HOEL)
Day one starts with some description of cleanroom environment, techniques used to fabricate field effect transistors, as well as safety in clean room processes.
Morning: 2x 1H30 - Interactive course (ppt) including evaluation
Afternoon: Cleanroom practical work: Lithography for ohmic contact 2 x 1h30 (Part 1/2)
Day 2: (Virginie HOEL)
Real fabrication of RF transistors and personal experience cases further illustrated by methodology. At each step, physical characterisation will be made to control the quality of the process.
Interactive practical work (ppt) including evaluation
Morning - Cleanroom practical work - Ohmic contact (Part 2/2) - 2 x 1h30
Afternoon - Cleanroom practical work - Gate contact: Schottky contact lithography 2 x 1h30
Day 3: (Sylvain BOLLAERT)
RF characterisation: The training course continues with the description of RF characterisation principles. Practical works will be made on the devices fabricated during the day 2.
Morning - RF characterisation - theory 2 x 1h30
Afternoon - Practical work - RF characterisation - 2 x 1h30
Day 4: (Henri HAPPY)
During the fourth day of the course, the next step will concern introduction to nanotechnology. To this end, near field microscope such as AFM will be introduced. In order to discover how works an AFM microscope, we are going to image a serie of samples in different mode.
Morning - AFM - STM theory 2 x 1h30
Afternoon - Practical work - AFM characterisation - 2 x 1h30
Day 5: (Virginie HOEL)
The AFM tip will be used as a fabrication tool in order to draw some nano-structure on an adequate substrate (Silicon). These nano-structures (nano-oxidation) will be used as a mask to develop nanolithography approach necessary to fabricate silicon nanowire.
Morning - AFM nano fabrication and nano-characterisation 2 x 1h30
he microelectronic constitutes a foremost driver of the scientific and technological progress that has made a major contribution to social and economic growth worldwide. With the evolution of microelectronic toward nanoelectronics (one of the field of nanotechnology) that requires a multidisciplinary approach, it is important to invest more effort in research, manufacturing and education.
The aim of this training is to offer young researchers a structured view of the principles involved in the fabrication and characterisation of nano-components, oriented to radiofrequency applications. This program addresses in particular graduate students and postdoctoral scientists entering the field. The program we propose during one week is planned to explore nanofabrication for top-down approach, the techniques of nano-measurements, nano-characterisation and the physical principles behind them, as well as other experimental methods and instrumental skills necessary for research in this field.
The course will take place in the technological platform of the GIP CNFM at Lille1 University, dedicated to education. This platform includes one clean room, one design room and one characterisation room oriented to RF applications.
The staff member is composed of researchers (Professor or Assistant-Professor) linked to the research institute IEMN (Institut d'Electronique, de Microelectronique et de Nanotechnologies). IEMN gathers in a unique structure, an important research field, from nanosciences to their applications.
This course fulfills all the criteria imposed by the FP7 EURO-DOTS program, and has been provisionally granted the EURO-DOTS label. PhD students fulfilling the requirements can apply for a scholarship.
Who should attend?
The prerequisite for the course is a basic knowledge of semiconductor devices and circuits. It addresses the training needs of all electrical engineering community involved in microelectronics and nanoelectronics.
PhD students and members of academic institutes will particularly benefit from up-to-date information for their current research and teaching.
This course is also intended for any IC design engineer already working in academia or semiconductor industry, technical supervisors, managers and directors working in, or having responsibilities for:
- IC design, layout and characterisation
- Research and development
- Decision making for technology choice and architectures
- Projects completion
The course aims to cover a broad view on the subject, from short introduction to an in-depth knowledge and to practical aspects and hints, which can be applied immediately after the course. This is why this course will have special appeal to different level of expertise, from beginners to advanced specialists in the field.
The course will be held at University of Lille 1, in the CNFM platform located at building P3. This description can be found on the web site of Lille 1 University using the link: http://www.univ-lille1.fr/Accueil/plan-acces/
You need to download the map before zooming and localize P3 building
Fees and regulations
Registration fee include housing (two students sharing studio), lunch, course proceeding and coffee break. After every main part of the training, a short test will be made.
Lodging arrangements and costs
University of Lille 1 have a partnership with the hotel "Les Citadines" located in the downtown of Lille, at less than 20 mn from campus, using metro. Conveniently situated near the TGV railway station, the Citadines City Centre Lille is an ideal hub from which you can easily access high-speed train links from the station to numerous European capitals. This apartment hotel offers every commodity. Each studio (for two pearson) houses a bathroom with a separate toilet, a fully-equipped separate kitchen area complete with stove, microwave, fridge and dishwasher, TV with cable channels, a direct-line phone, hairdryer, hifi system and safe deposit box. The negociated price is 63 euros.
Virginie Hoël was born in France, on October 9, 1972. She received the Ph.D. degree from the University of Lille, Lille, France, in 1998. She is currently an Assistant Professor at Institut d'Électronique, de Microélectronique et de Nanotechnologie (IEMN), Villeneuve d'Ascq, France. From 1995 to 2000, she was working on design, fabrication and characterisation of InP HEMTs for application in millimeter- and submillimeter-wave ranges.
Since 2000, she worked on power devices. His main research interests include design, fabrication and characterisation of AlGaN/GaN HEMTs for high power applications in centimeter- and millimeter-wave ranges. Virginie HOEL is author or co-author of about 60 international publications and communications. She received in 1999 the best paper award for the work: «94-GHz Low Noise Amplifier on InP in Coplanar Technology» during the GAAS'99 European Microwave Week which was held in MUNICH. Her main teaching activities concern : Semiconductor Physics and Electronic Devices, Clean Room Environment, Fabrication of Transistors, Electronic Circuits and Microwave Measurement.
She has 5 publications in the education domain linked to the conference "Journées pédagogiques du CNFM". The CNFM (Coordination Nationale pour la Formation en Micro et Nanoélectronique) is a G.I.P (group of interest) involved in the training of the micro and nano electronic in France.
Training (7 hours a day) is planned for a group of not less than 10 trainees. It will alternate theoretical training (lectures) for one third and practical training for the remaining two thirds of the overall duration. The practical guidance is at the rate of one teacher per 5‐7 students. All courses and related documents will be given in English.
- Lectures covering the fundamental aspects (6h)
- Manufacturing of the RF transistors in clean room (12h)
- Characterization of dispositive (DC and RF) (8h)
- Fabrication and characterisation of silicon nanowires using AFM and nano-oxydation technique (8h)